柳克強 副教授  清華大學工程與系統科學系  
                

 

 

 

Major Equipment:

  • Ionized Metal (Cu) Plasma (ICP Enhanced Magnetron Sputtering) System (homemade)

Features:

  • High magnetic field strength magnetron design

  • Metal ion/neutral fraction controlled by Inductively coupled plasma (40 MHz RF, CW/pulsed)

  • Wafer size: up to 100 mm

  • Vacuum system:                        1000 l/s Turbo molecular pump  and throttle valve             

  • DC magnetron power: 10 kW

  • ICP RF power:  1 kW,  40 MHz

  • Substrate RF bias :  600 W, 2 MHz

 

  • Carbon-nanotube field emitter surface treatment and field emission characterization system