ESS4520 Introduction to Thin Film Engineering, 薄膜工程導論


Course Description:

This course firstly introduces vacuum technology and kinetics of surface processes. The major content includes the vapor deposition processes, PVD and CVD, and film formation and structure. The methods of characterization of thin film will be briefly introduced. To take this course, students are required to have some background on Materials Science (ESS2500 Introduction to Materials Science or Physical Metallurgy I,II) and on Thermodynamics of Materials (ESS2510 or equivalent).

課程說明:

本課先簡介真空科技與材料表面動力學,在進入薄膜相關主題。主要內容包括:物理氣相沉積、化學氣相沉積與薄膜生成與薄膜結構。最後並簡介薄膜分析方法。本課程先修課:物理冶金()()、材料熱力學。